EUV lithography is important because it makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the …

The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will provide 8 nm resolution to support advanced Logic and Memory chip production.

Jan 25, 2024 · We’re bringing you the what, why and how behind the TWINSCAN EXE:5000, ASML’s latest extreme ultraviolet (EUV) lithography system.

The dual-stage extreme ultraviolet (EUV) lithography system is designed to support volume production of sub-2 nm Logic nodes and leading-edge DRAM nodes.

The EUV lithography solutions provided by the TWINSCAN NXE:3600D are complementary to those provided by our TWINSCAN NXT systems based on ArF immersion technology.

Jun 3, 2024 · The opening of the joint ASML-imec High NA EUV Lab represents a milestone in preparing High NA EUV for high-volume manufacturing – anticipated to happen in the 2025–2026 timeframe.

EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light.

Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

Jan 19, 2022 · At the 2021 Investor Day, ASML shared its EUV roadmap and indicated that High-NA technology is expected to start supporting production manufacturing in 2025. Today's announcement …