A disclosure on China's government procurement platform shows that Shanghai Micro Electronics Equipment (SMEE) has won a ...

KLA-Tencor Corp. and ASML today jointly announced the introduction of analysis software that will let chipmakers automatically transfer overlay test data from KLA's 5000 series overlay metrology tools ...

Belgian research center IMEC today announced it has extended its lithography industrial affiliation program (IIAP) through 2003, using ASML’s PAS5500/1100 high NA 193nm step-and-scan system, ...

Scanning probe lithography (SPL) represents a rapidly evolving class of nanofabrication techniques that utilise the precision of scanning probe microscopy to directly manipulate material surfaces at ...

Modern photolithography machines must deliver extraordinary precision on a repeatable basis, and in high volume production. In response to demands for increased throughput in the semiconductor ...