Patterning challenges for the semiconductor industry are growing as the number of multi-patterned layers being used in the 10nm and beyond nodes increase. Patterning requires highly accurate overlay ...

General discussion in the metrology field tends to revolve around the relative merits of non-contact or contact measurement solutions. However, demand now exists in almost every industry for more ...

University of Illinois Physics Professor Paul Kwiat and members of his research group have developed a new tool for precision measurement at the nanometer scale in scenarios where background noise and ...

There are significantly different architectures for what are known as “atomic” clocks. Optically driven atomic clocks offer a new set of performance attributes. The optical atomic clocks use paired ...